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MaterialGate

Hiroshima University Incubation Office, Rooms 1 & 2, 3-10-31 Kagamiyama, Higashihiroshima, Hiroshima, Japan

Overview

MaterialGate is a Hiroshima-based deep-tech startup founded in June 2023 that is pioneering “single-molecule dielectric” technology, a next-generation semiconductor memory material capable of storing information within an individual molecule at room temperature. Memory devices built with this material, called single-molecule dielectric memory, promise roughly 1,000-times higher storage density and about 90 % lower power consumption compared with conventional memory solutions. The company operates from the Hiroshima University Incubation Office and has a stated capital of ¥3 million. MaterialGate’s core focus is advancing the material science and fabrication processes necessary to commercialize this breakthrough memory, potentially reshaping data-center and edge-device architectures. To accelerate R&D and prototype production, the firm has attracted venture financing, bringing its total funds raised to ¥910 million. These resources will reportedly be used to expand laboratory capabilities, hire specialized engineers, and deepen collaborations with semiconductor manufacturers. No revenue or user metrics have been disclosed to date, underscoring the company’s pre-commercial, research-heavy stage.

Total raised
$7M
Funding rounds
2
Latest round
Seed
Latest activity
Feb 2026

Industries

  • Electronics
  • Energy Storage
  • Manufacturing
  • Semiconductor
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Recent funding

  1. Seed

    Feb 2026

    $6M

  2. Seed

    Jul 2024

    $1M

Team

  • Kentaro Ise

    COO

  • Yoshifumi Nishihara

    CSO