Nearfield Instruments designs next-generation scanning probe microscopy systems and the proprietary QUADRA platform to deliver in-line 3D nanometer-scale metrology and non-destructive, high-throughput atomic force microscopy (AFM) with full 3D imaging capabilities. Its systems target critical measurements including sidewall metrology for high-aspect-ratio trenches, GAA recesses, vias, multi-layer stacks, High-NA EUV, CFET architectures, and hybrid-bonded 3D integration. The company emphasizes automation, fast measurement cycles, and compatibility with fab standards for integration into high-volume manufacturing environments. Nearfield works closely with leading semiconductor manufacturers and research partners and operates R&D and support activities across multiple Asia-Pacific and Western markets. The company employs about 450 people and was founded in 2016 as a spin-off from TNO, headquartered in Rotterdam. Following the $380 million Series D at a $1.6 billion valuation, Nearfield plans to expand production capacity, global customer support, Applications Centers of Excellence, and collaborative R&D with chipmakers.

Total raised

$528M

Funding rounds

2

Latest round

Series D

Latest activity

Jun 2026