SCIL Nanoimprint Solutions commercialises Substrate Conformal Imprint Lithography (SCIL), a proprietary lithography process that patterns nanometer‑resolution features on wafer areas up to 300 mm. The process can create feature sizes below 10 nm with overlay alignment down to 1 µm and is positioned for high‑volume, low‑cost production. SCIL’s technology targets applications including AR smart glasses, lasers, biosensors and other nanoimprint uses. The company spun out from Philips Research in 2016 and is based in Eindhoven. With newly secured growth financing, SCIL intends to scale up operations and reinforce its market‑leader status. Management says the investors will provide financial support and strategic insights to accelerate industrialisation and international growth.

Total raised

$11M

Funding rounds

1

Latest round

Equity

Latest activity

Dec 2023